Antenna configuration for uniform large-area inductively coupled plasma production
نویسندگان
چکیده
منابع مشابه
Two-dimensional fluid simulation of large-area plasma source with parallel resonance antenna
Inductively coupled plasma source operating at low pressure to improve uniform and high plasma density is widely employed for microelectronic device fabrication. As the size of the inductively coupled source increases, it has the problems related to the electrical characteristic and non-uniformity. To improve the non-uniformity, the roles of the parallel resonance antenna are presented. The two...
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